Characterization and Metrology of Low Pressure Chemical Vapor Deposited (LPCVD) Polysilicon

  • Leo Asinovsky, Michael Schroth, Fei Shen, John Sweeney
  • MRS Proceedings, January 1996, Cambridge University Press
  • DOI: 10.1557/proc-452-1013

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http://dx.doi.org/10.1557/proc-452-1013