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http://dx.doi.org/10.1557/opl.2012.867
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Rapid Epitaxial Growth of Si and SiGe Mono-Crystalline Films on Silicon-on-Glass Substrates by Reactive CVD Using SiH4, GeH4, and F2
Hiroshi Noge, Akira Okada, Ta-Ko Chuang, J. Greg Couillard, Michio Kondo- MRS Proceedings, January 2012, Cambridge University Press
- DOI: 10.1557/opl.2012.867