What is it about?

Strain engineering is a well established concept in functional epitaxy. Nevertheless, its extension to oxides is challenged by yet poorly understood deformation mechanisms of their framework crystal structure. This work is about how such mechanisms control the growth mechanism and properties of functional oxide epitaxial thin films.

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Why is it important?

This work is important because it provides a new perspective of strain engineering from the point of view of oxides, otherwise essential for a prediictive manipulation of strain in oxide epitaxy.


The invitation to write this review was a great opportunity to put together ideas that emerged during the last few years working on different aspects of strain in oxide thin film epitaxy, that otherwise would have probably remained in the drawer.

Felip Sandiumenge
Institut de Ciència de Materials de Barcelona (ICMAB-CSIC)

Read the Original

This page is a summary of: Strain landscapes and self-organization of free surfaces in complex oxide epitaxy, Journal of Materials Research, August 2017, Cambridge University Press,
DOI: 10.1557/jmr.2017.317.
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