What is it about?
The effects of the surface roughness of thin films and defects on photomasks are investigated in two representative plasmonic lithography systems: thin silver film-based superlens and multilayer-based hyperbolic metamaterial (HMM). The analyses show that the systems with the function of spatial frequency selection are more immune to the imperfections.
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Why is it important?
Our findings present that the superlens, called perfect lens, is unperfect in producing deep subwavelength periodic patterns. Instead, the multilayers or optical waveguide mode would generate uniform patterns with high aspect. These analyses give new insights into plasmonic nanopatterning, and can be a useful guideline in designing future plasmonic lithography systems.
Perspectives
The main work of this artical is finished during my abroad time in US. The guidance and help from the group leader and members make me benefit a lot. I hope this article makes people think more about the performance of the surface polaritons, and aviod detours and mistakes during designing the plasmonic devices.
Gaofeng Liang
Chongqing University
Read the Original
This page is a summary of: Achieving pattern uniformity in plasmonic lithography by spatial frequency selection, Nanophotonics, January 2017, De Gruyter,
DOI: 10.1515/nanoph-2017-0028.
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