Characterization of 248nm Deep Ultraviolet (DUV) Photoresist after Ion Implantation

  • Diana Tsvetanova, Rita Vos, Guy Vereecke, Francesca Clemente, Kris Vanstreels, Thierry Conard, Alexis Franquet, Tatiana N. Parac-Vogt, Paul Mertens, Marc M. Heyns
  • January 2009, The Electrochemical Society
  • DOI: 10.1149/1.3202652

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http://dx.doi.org/10.1149/1.3202652

The following have contributed to this page: Professor Tatjana N. Parac-Vogt