Deep-Level Defects in High-Dose Proton Implanted and High-Temperature Annealed Silicon

M. Jelinek, J. Laven, M. Rommel, W. Schustereder, H.-J. Schulze, L. Frey, R. Job
  • ECS Transactions, August 2014, The Electrochemical Society
  • DOI: 10.1149/06411.0173ecst
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The following have contributed to this page: Dr. Mathias Rommel