TiO2-Based Metal-Insulator-Metal Structures for Future DRAM Storage Capacitors

K. Frohlich, B. Hudec, M. Tapajna, K. Husekova, A. Rosova, P. Elias, J. Aarik, R. Rammula, A. Kasikov, T. Arroval, L. Aarik, K. Murakami, M. Rommel, A. J. Bauer
  • ECS Transactions, March 2013, The Electrochemical Society
  • DOI: 10.1149/05013.0079ecst
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