Solid-phase crystallization of high growth rate amorphous silicon films deposited by gas-jet electron beam plasma CVD method 1

E.A. Baranov, S.Ya. Khmel, A.O. Zamchiy, I.V. Cheskovskaya, M.R. Sharafutdinov
  • Canadian Journal of Physics, July 2014, Canadian Science Publishing
  • DOI: 10.1139/cjp-2013-0580

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http://dx.doi.org/10.1139/cjp-2013-0580