Solid-phase crystallization of high growth rate amorphous silicon films deposited by gas-jet electron beam plasma CVD method 1

• E.A. Baranov, S.Ya. Khmel, A.O. Zamchiy, I.V. Cheskovskaya, M.R. Sharafutdinov

• Canadian Journal of Physics, July 2014, Canadian Science Publishing
• DOI: 10.1139/cjp-2013-0580