Adaptive Discretionary Wiring For Wafer Scale Integration Using Electron Beam Lithography

J. F. McDonald, M. Stanton, R. Rajapakse, H. Lin, R. Selvaraj, N . King, D. King, M . Haslam
  • June 1987, SPIE
  • DOI: 10.1117/12.940364

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http://dx.doi.org/10.1117/12.940364