Direct-Write Electron Beam Lithography For Integrated Circuits: Submicron Image Reversal Process Of Novolac-Diazo Resist And Its Stability Towards Composite Metallization In Bipolar Gate Arrays For Vlsi

Rao M. Nagarajan, Steven D. Rask, Brian R. Lee
  • June 1987, SPIE
  • DOI: 10.1117/12.940356

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http://dx.doi.org/10.1117/12.940356