High Resolution Positive Photoresist For Submicron Photolithography

Hidekatsu Kohara, Hatsuyuki Tanaka, Masanori Miyabe, Yoshiaki Arai, Shingo Asaumi, Toshimasa Nakayama
  • August 1987, SPIE
  • DOI: 10.1117/12.940344

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http://dx.doi.org/10.1117/12.940344