Lithographic Evaluation Of Copolymers With Enhanced Dry Etch Resistance

Y. M. Namaste, S. K. Obendorf, J. M. Rosenblum, G. G. Gifford, B. C. Dems, F. Rodriguez
  • August 1987, SPIE
  • DOI: 10.1117/12.940331

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http://dx.doi.org/10.1117/12.940331