A Study Of The Dissolution Kinetics If A Positive Photoresist Using Organic Acids To Simulate Exposed Photoactive Compounds

Lauren Blum, Mariorie E. Perkins, Andrew W. McCullough
  • August 1987, SPIE
  • DOI: 10.1117/12.940319

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http://dx.doi.org/10.1117/12.940319