Mechanism And Kinetics Of Silylation Of Resist Layers From The Gas Phase

Robert-Jan Visser, Jack P. Schellekens, Marian E. Reuhman-Huisken, Leo J. Van Ijzendoorn
  • August 1987, SPIE
  • DOI: 10.1117/12.940315

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http://dx.doi.org/10.1117/12.940315