Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance

  • Lan Chen, Yong-Keng Goh, Kirsten Lawrie, Bruce Smith, Warren Montgomery, Paul A. Zimmerman, Idriss Blakey, Andrew K. Whittaker
  • March 2010, SPIE
  • DOI: 10.1117/12.846971

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The following have contributed to this page: Idriss Blakey