Development of polymers for non-CAR resists for EUV lithography

  • Andrew K. Whittaker, Idriss Blakey, James Blinco, Kevin S. Jack, Kirsten Lawrie, Heping Liu, Anguang Yu, Michael Leeson, Wang Yeuh, Todd Younkin
  • March 2009, SPIE
  • DOI: 10.1117/12.820493

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The following have contributed to this page: Idriss Blakey