High-RI resist polymers for 193 nm immersion lithography

  • Andrew K. Whittaker, Idriss Blakey, Heping Liu, David J. T. Hill, Graeme A. George, Will Conley, Paul Zimmerman
  • May 2005, SPIE
  • DOI: 10.1117/12.600630

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The following have contributed to this page: Idriss Blakey