Impacts of SiO2 planarization on optical thin film properties and laser damage resistance

  • C. J. Stolz, P. Mirkarimi, J. Folta, J. Roehling, A. Markosyan, R. R. Route, M. M. Fejer, C. S. Menoni, T. Day, H. Wang, E. Jankowska, B. A. Reagan, J. J. Rocca
  • December 2016, SPIE
  • DOI: 10.1117/12.2245058

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http://dx.doi.org/10.1117/12.2245058