Process variation challenges and resolution in the negative-tone develop double patterning for 20nm and below technology node

Sohan S. Mehta, Lakshmi K. Ganta, Vikrant Chauhan, Yixu Wu, Sunil Singh, Chia Ann, Lokesh Subramany, Craig Higgins, Burcin Erenturk, Ravi Srivastava, Paramjit Singh, Hui Peng Koh, David Cho
  • March 2015, SPIE
  • DOI: 10.1117/12.2087546
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The following have contributed to this page: Mr. Sohan S Mehta