Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modeling

  • Amrit Narasimhan, Steven Grzeskowiak, Bharath Srivats, Henry Herbol, Liam Wisehart, Jonathon Schad, Chris Kelly, William Earley, Leonidas E. Ocola, Mark Neisser, Greg Denbeaux, Robert L. Brainard
  • Journal of Micro/Nanolithography MEMS and MOEMS, October 2015, SPIE
  • DOI: 10.1117/1.jmm.14.4.043502

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http://dx.doi.org/10.1117/1.jmm.14.4.043502