What is it about?
In the paper you can read about a new test method for interfacial mechanical testing of especially atomic layer deposited (ALD) thin films. The test method is generic and it can be applied to practically any coating-substrate-sphere-system. In this first proof-of-concept paper the authors used ALD TiO2 thin films on a glass substrate. The method gives quantitative information about interfacial mechanical properties. The method is further developed and the latest results can be found in http://dx.doi.org/10.1039/c4ra05807k.
Featured Image
Why is it important?
In the paper we present a new method for interfacial mechanical testing of especially atomic layer deposited (ALD) thin films. Good interfacial mechanical properties are essential for the practical use of any coating and traditional testing does now always give the sufficient information about film properties. Our method gives quantitative information about interfacial mechanical properties and it can be applied to practically any coating/substrate system.
Perspectives
This is a proof-of-concept paper about an interesting new characterization method for interfacial mechanical testing of especially atomic layer deposited thin films.
Mr Jussi Lyytinen
Aalto-yliopisto
Read the Original
This page is a summary of: Adhesion testing of atomic layer deposited TiO2 on glass substrate by the use of embedded SiO2 microspheres, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, January 2014, American Vacuum Society,
DOI: 10.1116/1.4827197.
You can read the full text:
Contributors
The following have contributed to this page
