Inductively coupled plasma etching of graded-refractive-index layers of TiO2 and SiO2 using an ITO hard mask

  • Ahmed N. Noemaun, Frank W. Mont, Jaehee Cho, E. Fred Schubert, Gi Bum Kim, Cheolsoo Sone
  • Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, January 2011, American Vacuum Society
  • DOI: 10.1116/1.3620494

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http://dx.doi.org/10.1116/1.3620494

The following have contributed to this page: Professor Jaehee Cho