Publication not explained
This publication has not yet been explained in plain language by the author(s). However, you can still read the publication.
If you are one of the authors, claim this publication so you can create a plain language summary to help more people find, understand and use it.
Featured Image
Read the Original
This page is a summary of: Growth behaviors of low-pressure metalorganic chemical vapor deposition aluminum silicate films deposited with two kinds of silicon sources: Hexamethyldisilazane and tetraethyl orthosilicate, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, September 2002, American Vacuum Society,
DOI: 10.1116/1.1446441.
You can read the full text:
Contributors
The following have contributed to this page