Effect of substrate bias and oxygen partial pressure on properties of RF magnetron sputtered HfO2 thin films

Sk. Maidul Haque, Pankaj R. Sagdeo, Shanmugam Balaji, Kalavathi Sridhar, Sanjiv Kumar, Debarati Bhattacharyya, Dibyendu Bhattacharyya, Naba K. Sahoo
  • Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, May 2014, American Vacuum Society
  • DOI: 10.1116/1.4825234

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http://dx.doi.org/10.1116/1.4825234

The following have contributed to this page: Professor Pankaj R Sagdeo