Gate oxide reliability at the nanoscale evaluated by combining conductive atomic force microscopy and constant voltage stress

T. Erlbacher, V. Yanev, M. Rommel, A. J. Bauer, L. Frey
  • January 2011, American Vacuum Society
  • DOI: 10.1116/1.3532820
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The following have contributed to this page: Dr. Mathias Rommel