Minimising the risk of defects in nano-imprint forming

Stoyan Stoyanov, Farid Amalou, Keith Sinclair, Chris Bailey, Marc Desmulliez
  • May 2008, Institute of Electrical & Electronics Engineers (IEEE)
  • DOI: 10.1109/isse.2008.5276670

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http://dx.doi.org/10.1109/isse.2008.5276670

The following have contributed to this page: Marc Desmulliez