Effects of thin dielectric layer on plasmon excitation in perforated metal films

V. Kaveckyte, R. Venckevicius, L. Minkevicius, B. Voisiat, G. Raciukaitis, G. Valusis, I. Kasalynas
  • September 2013, Institute of Electrical & Electronics Engineers (IEEE)
  • DOI: 10.1109/irmmw-thz.2013.6665878

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http://dx.doi.org/10.1109/irmmw-thz.2013.6665878

The following have contributed to this page: Dr Gediminas Raciukaitis