Publication
50 nm Vertical Replacement-Gate (VRG) pMOSFETs
Sang-Hyun Oh, J.M. Hergenrother, T. Nigam, D. Monroe, F.P. Klemens, A. Kornblit, W.M. Mansfield, M.R. Baker, D.L. Barr, F.H. Baumann, K.J. Bolan, T. Boone, N.A. Ciampa, R.A. Cirelli, D.J. Eaglesham, E.J. Ferry, A.T. Fiory, J. Frackoviak, J.P. Garno, H.J. Gossmann, J.L. Grazul, M.L. Green, S.J. Hillenius, R.W. Johnson, R.C. Keller, C.A. King, R.N. Kleiman, J.T.-C. Lee, J.F. Miner, M.D. Morris, C.S. Rafferty, J.M. Rosamilia, K. Short, T.W. Sorsch, A.G. Timko, G.R. Weber, G.D. Wilk, J.D. Plummer
Institute of Electrical & Electronics Engineers (IEEE)
DOI: 10.1109/iedm.2000.904260