Physical properties of HWCVD microcrystalline silicon thin films

  • H.R. Moutinho, M.J. Romero, C.-S. Jiang, Y. Xu, B.P. Nelson, K.M. Jones, A.H. Mahan, M.M. Al-Jassim
  • Institute of Electrical & Electronics Engineers (IEEE)
  • DOI: 10.1109/pvsc.2002.1190835

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http://dx.doi.org/10.1109/pvsc.2002.1190835