In-situ particle monitor using virtual metrology system for measuring particle contamination during plasma etching process

Mohd Firdaus Abdullah, Muhammad Khusairi Osman, Noratika Mohammad Somari, Adi Izhar Che Ani, Sooria Pragash Rao S. Appanan, Loh Kwang Hooi
  • January 2016, Institute of Electrical & Electronics Engineers (IEEE)
  • DOI: 10.1109/iccsce.2016.7893629

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http://dx.doi.org/10.1109/iccsce.2016.7893629