Modelling of the electrochemical etch stop with high reverse bias across pn-junctions

Robert Szwarc, Lothar Frey, Hans Weber, Iris Moder, Tobias Erlbacher, Mathias Rommel, Anton J. Bauer
  • May 2015, Institute of Electrical & Electronics Engineers (IEEE)
  • DOI: 10.1109/asmc.2015.7164437
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The following have contributed to this page: Dr. Mathias Rommel