Atomic- and electronic-structure study on the layers of 4 Hb - TaS 2 prepared by a layer-by-layer etching technique

Ju-Jin Kim, H. Olin
  • November 1995, American Physical Society (APS)
  • DOI: 10.1103/physrevb.52.r14388
The author haven't finished explaining this publicationThe author haven't finished explaining this publication

The following have contributed to this page: Professor Håkan Olin