The use of high aspect ratio photoresist (SU-8) for super-hydrophobic pattern prototyping

  • Neil J Shirtcliffe, Sanaa Aqil, Carl Evans, Glen McHale, Michael I Newton, Carole C Perry, Paul Roach
  • Journal of Micromechanics and Microengineering, July 2004, Institute of Physics Publishing
  • DOI: 10.1088/0960-1317/14/10/013

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http://dx.doi.org/10.1088/0960-1317/14/10/013

The following have contributed to this page: Professor Glen McHale and Dr Paul Roach