What is it about?
An our newly developed feedback control system could autonomously recover atom densities to the intended values in real time, on the basis of vacuum ultraviolet absorption spectroscopy measurements. Real-time process control is thus crucially achieved to suppress fluctuations in feature profiles due to plasma etching.
Featured Image
Why is it important?
It is necessary that processes be controlled in real time in order to minimize any fluctuations in etching characteristics to suppress perturbations such as modification of the chamber wall conditions. The unintentional perturbations were stabilized by real-time control to an intended value of the atom density ratio on the basis of quantitative vacuum ultraviolet absorption spectroscopy (VUVAS) of H and N atoms in the H2/N2 plasma.
Perspectives
Temporal changes in the H and N atom densities were significantly affected by the chamber wall conditions. To appropriately recover under control of the atom density ratio, distortions in the feature profile were minimized by suppressing the influence of the reactor wall condition. These indicate a new concept for realizing high precision control of plasma processing.
Dr Kenji Ishikawa
Nagoya University
Read the Original
This page is a summary of: Recovery of atom density drift caused by change in reactor wall conditions by real-time autonomous control, Journal of Physics D Applied Physics, September 2014, Institute of Physics Publishing,
DOI: 10.1088/0022-3727/47/42/422002.
You can read the full text:
Resources
Contributors
The following have contributed to this page
