A soft photo-mask with embedded carbon black and its application in contact photolithography

  • Yi-Ta Hsieh, Heng Hsieh, Yung-Chun Lee
  • Journal of Micromechanics and Microengineering, July 2014, Institute of Physics Publishing
  • DOI: 10.1088/0960-1317/24/8/085006

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http://dx.doi.org/10.1088/0960-1317/24/8/085006