A simple approach to sub-100 nm resist nanopatterns with a high aspect ratio

  • B Y Zong, P Ho, G C Han, G M Chow, J S Chen
  • Journal of Micromechanics and Microengineering, February 2013, Institute of Physics Publishing
  • DOI: 10.1088/0960-1317/23/3/035038

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http://dx.doi.org/10.1088/0960-1317/23/3/035038

The following have contributed to this page: Dr BaoYu Zong