Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography

Prashant K Kulshreshtha, Ken Maruyama, Sara Kiani, James Blackwell, Deirdre L Olynick, Paul D Ashby
  • Nanotechnology, July 2014, Institute of Physics Publishing
  • DOI: 10.1088/0957-4484/25/31/315301

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http://dx.doi.org/10.1088/0957-4484/25/31/315301