Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography

  • Prashant K Kulshreshtha, Ken Maruyama, Sara Kiani, James Blackwell, Deirdre L Olynick, Paul D Ashby
  • Nanotechnology, July 2014, Institute of Physics Publishing
  • DOI: 10.1088/0957-4484/25/31/315301

The authors haven't yet claimed this publication.

Read Publication