Evaluation of resistless Ga + beam lithography for UV NIL stamp fabrication

M Rumler, R Fader, A Haas, M Rommel, A J Bauer, L Frey
  • Nanotechnology, August 2013, Institute of Physics Publishing
  • DOI: 10.1088/0957-4484/24/36/365302
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The following have contributed to this page: Dr. Mathias Rommel