Stoichiometry of the ALD-Al2O3/4H–SiC interface by synchrotron-based XPS

Muhammad Usman, Sethu Saveda Suvanam, Milad Ghadami Yazdi, Mats Göthelid, Muhammad Sultan, Anders Hallén
  • Journal of Physics D Applied Physics, May 2016, Institute of Physics Publishing
  • DOI: 10.1088/0022-3727/49/25/255308
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The following have contributed to this page: Dr. Muhammad Usman