Low-level NO x removal in ambient air by pulsed corona technology

  • F J C M Beckers, W F L M Hoeben, A J M Pemen, E J M van Heesch
  • Journal of Physics D Applied Physics, June 2013, Institute of Physics Publishing
  • DOI: 10.1088/0022-3727/46/29/295201

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http://dx.doi.org/10.1088/0022-3727/46/29/295201

The following have contributed to this page: Dr W. F.L.M. Hoeben