Influence of CH4 Flow Rate on Microstructure and Properties of Ti-C:H Films Deposited by DC Reactive Magnetron Sputtering

  • Shengguo Zhou, Long Liu, Liqiu Ma, Yuechen Wang, Zhengbing Liu
  • Tribology Transactions, August 2016, Taylor & Francis
  • DOI: 10.1080/10402004.2016.1223387

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http://dx.doi.org/10.1080/10402004.2016.1223387