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Influence of CH4 Flow Rate on Microstructure and Properties of Ti-C:H Films Deposited by DC Reactive Magnetron Sputtering
- Shengguo Zhou, Long Liu, Liqiu Ma, Yuechen Wang, Zhengbing Liu
- Tribology Transactions, August 2016, Taylor & Francis
- DOI: 10.1080/10402004.2016.1223387
