Dual radio frequency plasma source: Understanding via electrical asymmetry effect

B. Bora, H. Bhuyan, M. Favre, E. Wyndham, C. S. Wong
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4801874

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http://dx.doi.org/10.1063/1.4801874

The following have contributed to this page: Dr Chiow-San Wong

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