What is it about?
We utilize wavelength selective photoswitching to create nanostructures with resolution beyond the far-field diffraction limit. A photochromic film is exposed to a node at 633nm, which converts everything to an open-ring form except in a deep subwavelength region at the node, which remains as a closed-ring isomer. The closed-ring isomer may be selectively removed via an electrochemical oxidation to create nanostructures. The steps are repeated to create geometries in a dot-matrix fashion.
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Why is it important?
Our approach is unique because: (1) it uses only one inexpensive low power sources (HeNe laser and a UV lamp), (2) it can be fast since only single photon reactions are used; and (3) it has the potential to generate nanopatterns with resolution below 10nm. Our vision is create a simple scalable nanopatterning technology that is accessible to non-specialists.
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This page is a summary of: Subwavelength nanopatterning of photochromic diarylethene films, Applied Physics Letters, April 2012, American Institute of Physics,
DOI: 10.1063/1.4710547.
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