Atomistic mechanism of the initial oxidation of the clean Si(100)-(2×1) surface by O2 and SiO2 decomposition

Yuniarto Widjaja, Charles B. Musgrave
  • The Journal of Chemical Physics, April 2002, American Institute of Physics
  • DOI: 10.1063/1.1456036

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http://dx.doi.org/10.1063/1.1456036

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