What is it about?
Mixed gas plasmas are used in a variety of industrial applications. These plasmas emit radiation in the vacuum ultraviolet (VUV) wavelength range, which has enough energy to damage components produced in these industrial processes. We observe the emission from these plasmas in this wavelength range.
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Why is it important?
We observed that the emission in the VUV increased by up to a factor of 3.3 compared to a pure hydrogen plasma, dependant on the mixing gas, mixing ratio and total pressure. This is important because industrial processes utilising mixed gas plasmas could be introducing extra defects into process components as a result of this emission increase.
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This page is a summary of: Vacuum ultraviolet emission from mixed H2:Ar/Ne/He plasmas, Physics of Plasmas, January 2025, American Institute of Physics,
DOI: 10.1063/5.0229950.
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