Characterization of polishing induced defects and hydrofluoric acid passivation effect in ZnO

  • Zhichun Zhang, V. Quemener, C.-H. Lin, B. G. Svensson, L. J. Brillson
  • Applied Physics Letters, August 2013, American Institute of Physics
  • DOI: 10.1063/1.4818712
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http://dx.doi.org/10.1063/1.4818712

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