Improvement of SiO2/4H-SiC interface properties by electron cyclotron resonance microwave nitrogen-hydrogen mixed plasma post-oxidation annealing

  • Qiaozhi Zhu, Fuwen Qin, Wenbo Li, Dejun Wang
  • Applied Physics Letters, August 2013, American Institute of Physics
  • DOI: 10.1063/1.4818141

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http://dx.doi.org/10.1063/1.4818141

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