Kinetic evolution of blistering in hydrogen-implanted silicon

  • C. Coupeau, G. Parry, J. Colin, M.-L. David, J. Labanowski, J. Grilhé
  • Applied Physics Letters, July 2013, American Institute of Physics
  • DOI: 10.1063/1.4813858

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http://dx.doi.org/10.1063/1.4813858

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