Double oxide deposition and etching nanolithography for wafer-scale nanopatterning with high-aspect-ratio using photolithography

  • Jungho Seo, Hanchul Cho, Ju-kyung Lee, Jinyoung Lee, Ahmed Busnaina, HeaYeon Lee
  • Applied Physics Letters, July 2013, American Institute of Physics
  • DOI: 10.1063/1.4813738

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http://dx.doi.org/10.1063/1.4813738

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