In situ atomic layer deposition study of HfO2 growth on NH4OH and atomic hydrogen treated Al0.25Ga0.75N

Xiaoye Qin, Barry Brennan, Hong Dong, Jiyoung Kim, Christopher L. Hinkle, Robert M. Wallace
  • Journal of Applied Physics, January 2013, American Institute of Physics
  • DOI: 10.1063/1.4812243
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